Integrated circuit and system of manufacturing the same

ABSTRACT

An integrated circuit includes a first and second set of gate structures. A center of each of the first set of gate structures is separated from a center of an adjacent gate of the first set of gate structures in a first direction by a first pitch. A center of each of the second set of gate structures is separated from a center of an adjacent gate of the second set of gate structures in the first direction by the first pitch. The first and second set of gate structures extend in a second direction. A gate of the first set of gate structures is aligned in the second direction with a corresponding gate of the second set of gate structures. The gate of the first set of gate structures is separated from the corresponding gate of second set of gate structures in the second direction by a first distance.

PRIORITY CLAIM AND CROSS-REFERENCE

This application is a divisional of U.S. application Ser. No.15/861,128, filed Jan. 3, 2018, which claims the benefit of U.S.Provisional Application No. 62/511,847, filed May 26, 2017, which isherein incorporated by reference in its entirety.

BACKGROUND

The recent trend in miniaturizing integrated circuits (ICs) has resultedin smaller devices which consume less power yet provide morefunctionality at higher speeds. The miniaturization process has alsoresulted in stricter design and manufacturing specifications as well asreliability challenges. Various electronic design automation (EDA) toolsgenerate, optimize and verify standard cell layout designs forintegrated circuits while ensuring that the standard cell layout designand manufacturing specifications are met.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1A is a top view of a portion of an IC, in accordance with someembodiments.

FIG. 1B is a top view of a portion of an IC, in accordance with someembodiments.

FIG. 2 is a diagram of a layout design of an IC, in accordance with someembodiments.

FIG. 3 is a diagram of a layout design of an IC, in accordance with someembodiments.

FIG. 4 is a top view of a portion of an IC, in accordance with someembodiments.

FIG. 5 is a diagram of a layout design of an IC, in accordance with someembodiments.

FIG. 6 is a flowchart of a method of manufacturing an IC, in accordancewith some embodiments.

FIG. 7 is a flowchart of a method of generating a layout design of anintegrated circuit, in accordance with some embodiments.

FIG. 8 is a block diagram of a system of designing an IC layout design,in accordance with some embodiments.

FIG. 9 is a block diagram of an integrated circuit (IC) manufacturingsystem, and an IC manufacturing flow associated therewith, in accordancewith some embodiments.

DETAILED DESCRIPTION

The following disclosure provides different embodiments, or examples,for implementing features of the provided subject matter. Specificexamples of components, materials, values, steps, arrangements, or thelike, are described below to simplify the present disclosure. These are,of course, merely examples and are not limiting. Other components,materials, values, steps, arrangements, or the like, are contemplated.For example, the formation of a first feature over or on a secondfeature in the description that follows may include embodiments in whichthe first and second features are formed in direct contact, and may alsoinclude embodiments in which additional features may be formed betweenthe first and second features, such that the first and second featuresmay not be in direct contact. In addition, the present disclosure mayrepeat reference numerals and/or letters in the various examples. Thisrepetition is for the purpose of simplicity and clarity and does not initself dictate a relationship between the various embodiments and/orconfigurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

In accordance with some embodiments, a method of forming an integratedcircuit includes generating, by a processor, a layout design of theintegrated circuit, the integrated circuit having at least a gatestructure of a set of gate structures. In some embodiments, generatingthe layout design comprises generating a set of gate layout patternscorresponding to fabricating a set of gate structures of the integratedcircuit. The method further includes generating a cut feature layoutpattern, manufacturing the integrated circuit based on the layoutdesign, and removing a first portion of the gate structure of the set ofgate structures to form a first gate structure and a second gatestructure. In some embodiments, the cut feature layout patternidentifies a location of the first portion of the gate structure of theset of gate structures.

In some embodiments, the set of gate layout patterns includes a firstset of gate layout patterns and a second set of gate layout patterns. Insome embodiments, the first set of gate layout patterns corresponds tofabricating a set of functional gate structures of the integratedcircuit. In some embodiments, the second set of gate layout patternscorresponds to fabricating a set of non-functional gate structures ofthe integrated circuit. In some embodiments, non-functional gatestructures correspond to dummy gate structures.

In some embodiments, the cut feature layout pattern extends in a firstdirection and overlaps the set of gate layout patterns. In someembodiments, each of the layout patterns of the set of gate layoutpatterns is separated from an adjacent layout pattern of the set of gatelayout patterns in the first direction by a first pitch.

In some embodiments, the set of gate layout patterns extends in a seconddirection different from the first direction and overlapping a set ofgridlines. In some embodiments, the set of gridlines extends in thesecond direction. In some embodiments, each gridline of the set ofgridlines is separated from an adjacent gridline of the set of gridlinesby the first pitch.

One or more embodiments include an integrated circuit and acorresponding layout design of the integrated circuit with betterperformance than other approaches. In some embodiments, gates and dummygates of the integrated circuit are placed closer together than otherapproaches resulting in a smaller area of the integrated circuit of thepresent disclosure than other approaches. In some embodiments, the firstset of gate layout patterns and the second set of gate layout patternsof the present disclosure are placed closer together than otherapproaches resulting in a smaller area of the layout design of theintegrated circuit than other approaches. In some embodiments, byplacing the first set of gate layout patterns and the second set of gatelayout patterns closer together than other approaches results in alayout design with more uniform gate pattern density causing lessdishing from chemical mechanical planarization (CMP) processes thanother approaches. In some embodiments, by placing the gates and dummygates closer together results in an integrated circuit with a moreuniform gate pattern density causing less dishing from CMP processesthan other approaches. In some embodiments, the method of manufacturingthe integrated circuit of the present disclosure has more regular gatelayout patterns yielding greater process control (e.g., etching) thanother approaches. In some embodiments, a regular layout pattern is alayout pattern aligned with another layout pattern in at least onedirection (e.g., first direction or second direction). In someembodiments, by placing the gates and dummy gates closer togetherresults in an integrated circuit with more uniform gate pattern densitycausing less polysilicon stitching than other approaches. In someembodiments, by placing the first set of gate layout patterns and thesecond set of gate layout patterns closer together results in a layoutdesign with more uniform gate pattern density and less polysiliconstitching than other approaches.

FIG. 1A is a top view of a portion of an IC 100A, in accordance withsome embodiments. IC 100A includes a first set of gate structures 102and a second set of gate structures 104. The first set of gatestructures 102 is separated from the second set of gate structures 104by a cut distance Dv. In some embodiments, the first set of gatestructures 102 corresponds to one or more gates of functional transistordevices. In some embodiments, the second set of gate structures 104corresponds to one or more gates of non-functional transistor devices.In some embodiments, non-functional transistor devices are referred toas dummy transistor devices. In some embodiments, the second set ofgates 104 are referred to as dummy gates. In some embodiments, IC 100Acorresponds to an integrated circuit after operation 606 in method 600(FIG. 6).

The first set of gate structures 102 includes one or more of gatestructures 102 a, 102 b, 102 l. A side of each gate structure 102 a, 102b, . . . , 102 l of the first set of gate structures 102 is separatedfrom a side of an adjacent gate structure of the first set of gatestructures 102 in a first direction X by a distance S1. Each gatestructure 102 a, 102 b, . . . , 102 l of the first set of gatestructures 102 extends in a second direction Y different from the firstdirection X. In some embodiments, the second direction Y is orthogonalto the first direction X. Each gate structure 102 a, 102 b, . . . , 102l of the first set of gate structures 102 overlaps a correspondinggridline 106 a, 106 b,..., 106 l (collectively referred to as “gridlines106”). Other configurations or quantities of gate structures in thefirst set of gate structures 102, gate structures in the second set ofgate structures 104 or gridlines 106 are within the contemplated scopeof the present disclosure.

Gridlines 106 are arranged in second direction Y. Each gridline ofgridlines 106 is separated from an adjacent gridline of gridlines 106 bya pitch PH. In some embodiments, gridlines 106 define regions where gatestructures in the first set of gate structures 102 or in the second setof gate structures 104 are positioned.

The second set of gate structures 104 includes one or more of gatestructures 104 a, 104 b,... , 104 l. A side of each gate structure 104a, 104 b,... , 104 l of the second set of gate structures 104 isseparated from a side of an adjacent gate structure of the second set ofgate structures 104 in the first direction X by the distance S1. Eachgate structure 104 a, 104 b,... , 104 l of the second set of gatestructures 104 extends in a second direction Y. Each gate structure 104a, 104 b,... , 104 l of the second set of gate structures 104 overlaps acorresponding gridline 106 a, 106 b,... , 106 l.

In some embodiments, each gate structure 104 a, 104 b,... , 104 l of thesecond set of gate structures 104 is aligned with a corresponding gatestructure 102 a, 102 b,... , 102 l of the first set of gate structures102.

In some embodiments, an edge of gate structure 104 a, 104 b,... , 104 lof the second set of gate structures 104 is aligned in the seconddirection Y with an edge of a corresponding gate structure 102 a, 102b,... , 102 l of the first set of gate structures 102.

In some embodiments, a longitudinal center of gate structure 104 a, 104b,... , 104 l of the second set of gate structures 104 is aligned in thesecond direction Y with a longitudinal center of a corresponding gatestructure 102 a, 102 b, . . . , 102 l of the first set of gatestructures 102.

In some embodiments, a gridline 106 a, 106 b, . . . , 106 l is alignedin the second direction Y with a center of a corresponding gatestructure 104 a, 104 b,... , 104 l of the second set of gate structures104 or a center of a corresponding gate structure 102 a, 102 b,... , 102l of the first set of gate structures 102. In some embodiments, agridline 106 a, 106 b,... , 106 l is aligned in the second direction Ywith a side of a corresponding gate structure 104 a, 104 b,... , 104 lof the second set of gate structures 104 or a side of a correspondinggate structure 102 a, 102 b,... , 102 l of the first set of gatestructures 102.

In some embodiments, a gridline 106 a, 106 b,... , 106 l is offset inthe first direction X with a center of a corresponding gate structure104 a, 104 b,... , 104 l of the second set of gate structures 104 by asame distance (not shown) as being offset from a center of acorresponding gate structure 102 a, 102 b,... , 102 l of the first setof gate structures 102.

In some embodiments, each gate structure 104 a, 104 b,... , 104 l of thesecond set of gate structures 104 is separated from a corresponding gatestructure 102 a, 102 b,... , 102 l of the first set of gate structures102 by cut distance Dv. In some embodiments, the cut distance Dv rangesfrom about 0.01 μm to about 0.06 μm.

In some embodiments, at least one gate structure 104 a, 104 b,... , 104l of the second set of gate structures 104 or at least one gatestructure 102 a, 102 b,... , 102 l of the first set of gate structures102 has a width D_(H) in the first direction X.

In some embodiments, at least one gate structure 104 a, 104 b,... , 104l of the second set of gate structures 104 or at least one gatestructure 102 a, 102 b,... , 102 l of the first set of gate structures102 comprises polysilicon, or the like.

In some embodiments, IC 100A, 100B (FIG. 1B) or 400 (FIG. 4) correspondsto one or more standard cells. In some embodiments, a standard cell is alogic gate cell. In some embodiments, a logic gate cell includes an AND,OR, NAND, NOR, XOR, INV, AND-OR-Invert (AOI), OR-AND-Invert (OAI), MUX,Flip-flop, BUFF, Latch, delay, clock cells, or the like. In someembodiments, a standard cell is a memory cell. In some embodiments, amemory cell includes a static random access memory (SRAM), a dynamic RAM(DRAM), a resistive RAM (RRAM), a magnetoresistive RAM (MRAM), read onlymemory (ROM), or the like. In some embodiments, a standard cell includesone or more active or passive elements. Examples of active elementsinclude, but are not limited to, transistors, diodes, or the like.Examples of transistors include, but are not limited to, metal oxidesemiconductor field effect transistors (MOSFET), complementary metaloxide semiconductor (CMOS) transistors, bipolar junction transistors(BJT), high voltage transistors, high frequency transistors, p-channeland/or n-channel field effect transistors (PFETs/NFETs), etc.), FinFETs,planar MOS transistors with raised source/drain, or the like. Examplesof passive elements include, but are not limited to, capacitors,inductors, fuses, resistors or the like. In some embodiments, IC 100Aincludes other features not shown for ease of illustration.

In some embodiments, a distance between gate structures in the first setof gate structures 102 and gate structures in the second set of gatestructures 104 is smaller than other approaches. In some embodiments, byplacing gate structures in the first set of gate structures 102 and gatestructures in the second set of gate structures 104 closer together thanother approaches, results in a smaller area of IC 100A, 100B or 400 thanother approaches. In some embodiments, by placing gate structures in thefirst set of gate structures 102 and gate structures in the second setof gate structures 104 closer together than other approaches, IC 100A,100B or 400 has a more uniform gate pattern density than otherapproaches causing less dishing from CMP processes than otherapproaches. In some embodiments, by placing gate structures in the firstset of gate structures 102 and gate structures in the second set of gatestructures 104 closer together than other approaches, IC 100A, 100B or400 has a more uniform gate pattern density than other approachescausing less polysilicon stitching than other approaches.

FIG. 1B is a top view of a portion of an IC 100B, in accordance withsome embodiments. IC 100B is a variation of IC 100A (FIG. 1A). Incomparison with IC 100A of FIG. 1A, IC 100B further includes a set ofgate structures 108 between the first set of gate structures 102 and thesecond set of gate structures 104. The set of gate structures 108 couplethe first set of gate structures 102 to the second set of gatestructures 104. In some embodiments, the first set of gate structures102, second set of gate structures 104 and set of gate structures 108are integrally formed. In some embodiments, IC 100B corresponds to anintegrated circuit after operation 604 in method 600 (FIG. 6).

The set of gates structures 108 includes one or more of gate structures108 a, 108 b, 108 l. A side of each gate structure 108 a, 108 b,.. . ,108 l of the set of gate structures 108 is separated from a side of anadjacent gate structure of the set of gate structures 108 in the firstdirection X by distance Sl. Each gate structure 108 a, 108 b,.. . , 108l of the set of gate structures 108 extends in the second direction Y.Each gate structure 108 a, 108 b,.. . , 108 l of the set of gatestructures 108 overlaps a corresponding gridline 106 a, 106 b,..., 106l.

In some embodiments, at least one gate structure 108 a, 108 b,. . . ,108 l of the set of gate structures 108 has width DH in the firstdirection X. In some embodiments, each gate structure 108 a, 108 b,. . ., 108 l of the set of gate structures 108 has a length in the seconddirection equal to cut distance D_(V).

In some embodiments, each gate structure 108 a, 108 b,. . . , 108 l ofthe set of gate structures 108 is aligned with a corresponding gatestructure 104 a, 104 b,. . . , 104 l of the second set of gatestructures 104 or a corresponding gate structure 102 a, 102 b,. . . ,102 l of the first set of gate structures 102.

In some embodiments, an edge of gate structure 108 a, 108 b,. . . , 108l of the set of gate structures 108 is aligned in the second direction Ywith an edge of a corresponding gate structure 102 a, 102 b,. . . , 102l of the first set of gate structures 102 or an edge of gate structure104 a, 104 b,. . . , 104 l of the second set of gate structures 104.

In some embodiments, a center of gate structure 104 a, 104 b,. . . , 104l of the second set of gate structures 104 is aligned in the seconddirection Y with a center of a corresponding gate structure 102 a, 102b,. . . , 102 l of the first set of gate structures 102.

In some embodiments, a gridline 106 a, 106 b,. . . , 106 l is aligned inthe second direction Y with a center of a corresponding gate structure108 a, 108 b,. . . , 108 l of the set of gate structures 108. In someembodiments, a gridline 106 a, 106 b,. . . , 106 l is aligned in thesecond direction Y with a side of a corresponding gate structure 108 a,108 b,. . . , 108 l of the set of gate structures 108.

In some embodiments, at least one gate structure of the set of gatestructures 108 comprises polysilicon, or the like.

FIG. 2 is a diagram of a layout design 200 of an IC, in accordance withsome embodiments.

Layout design 200 is usable to manufacture IC 100A (FIG. 1A) or 100B(FIG. 1B). Components that are the same or similar to those in each ofFIGS. 1A-1B or 2-5 are given the same reference numbers, and detaileddescription thereof is thus omitted.

Structural relationships including alignment, lengths and widths, aswell as configurations of layout design 200, layout design 300 (FIG. 3),layout design 500 (FIG. 5) are similar to the structural relationshipsand configurations of IC 100A-100B of FIGS. 1A-1B or IC 400 of FIG. 400,and will not be described for brevity.

Layout design 200 includes a first set of gate layout patterns 202, asecond set of gate layout patterns 204, and a poly cut feature layoutpattern 210. The first set of gate layout patterns 202 is usable tomanufacture a corresponding first set of gate structures 102 (FIGS.1A-1B) of IC 100A-100B. The second set of gate layout patterns 204 isusable to manufacture a corresponding second set of gate structures 104(FIGS. 1A-1B) of IC 100A-100B. In some embodiments, the portion of thegate structure 108 that is removed in operation 606 of method 600 (FIG.6) is identified in layout designs 200 and 300 by poly cut featurelayout pattern 210 (FIGS. 2-3).

The first set of gate layout patterns 202 and second set of gate layoutpatterns 204 extend in the second direction Y and overlap the set ofgridlines 106. The first set of gate layout patterns 202 and second setof gate layout patterns 204 are separated from each other in the seconddirection Y by a distance corresponding to a pattern width Wiv in thesecond direction Y.

The first set of gate layout patterns 202 includes one or more of gatelayout patterns 202 a, 202 b,. . . , 202 l. In some embodiments, acenter of each layout pattern of the first set of gate layout patterns202 is separated from a center of an adjacent layout pattern of thefirst set of gate layout patterns 202 in the first direction X by apitch P1. In some embodiments, a side of each layout pattern of thefirst set of gate layout patterns 202 is separated from a side of anadjacent layout pattern of the first set of gate layout patterns 202 inthe first direction X by a distance S2. Each layout pattern of the firstset of gate layout patterns 202 extends in the second direction Y andoverlaps set of gridlines 106.

In some embodiments, each gridline of the set of gridlines 106 isseparated from an adjacent gridline of the set of gridlines 106 by pitchP1.

The second set of gate layout patterns 204 includes one or more of gatelayout patterns 204 a, 204 b,. . . 204 l. In some embodiments, a centerof each layout pattern of the second set of gate layout patterns 204 isseparated from a center of an adjacent layout pattern of the second setof gate layout patterns 204 in the first direction X by pitch P1. Insome embodiments, a side of each layout pattern of the second set ofgate layout patterns 204 is separated from a side of an adjacent layoutpattern of the second set of gate layout patterns 204 in the firstdirection X by a distance S2. Each layout pattern of the second set ofgate layout patterns 204 extends in the second direction Y and overlapsset of gridlines 106.

In some embodiments, each layout pattern 202 a, 202 b,. . . , 202 l ofthe first set of gate layout patterns 202 is aligned with acorresponding gate layout pattern 204 a, 204 b,. . . , 204 l of thesecond set of gate layout patterns 204.

In some embodiments, an edge of gate layout pattern 202 a, 202 b,. . . ,202 l of the first set of gate layout patterns 202 is aligned in thesecond direction Y with an edge of a corresponding gate layout pattern204 a, 204 b,. . . , 204 l of the second set of gate layout patterns204.

In some embodiments, a center of gate layout pattern 202 a, 202 b,. . ., 202 l of the first set of gate layout patterns 202 is aligned in thesecond direction Y with a center of a corresponding gate layout pattern204 a, 204 b,. . . , 204 l of the second set of gate layout patterns204.

In some embodiments, a gridline 106 a, 106 b,. . . , 106 l is aligned inthe second direction Y with a center of a corresponding gate layoutpattern 204 a, 204 b,. . . , 204 l of the second set of gate layoutpatterns 204 or a center of a corresponding gate layout pattern 202 a,202 b,. . . , 202 l of the first set of gate layout patterns 202. Insome embodiments, a gridline 106 a, 106 b,. . . , 106 l is aligned inthe second direction Y with a side of a corresponding gate layoutpattern 204 a, 204 b,. . . , 204 l of the second set of gate layoutpatterns 204 or a side of a corresponding gate layout pattern 202 a, 202b,. . . , 202 l of the first set of gate layout patterns 202. In someembodiments, a gridline 106 a, 106 b,. . . , 106 l is offset in thefirst direction X with a center of a corresponding gate layout pattern204 a, 204 b,. . . , 204 l of the second set of gate layout patterns 204by a same distance (not shown) as being offset from a center of acorresponding gate layout pattern 202 a, 202 b,. . . , 202 l of thefirst set of gate layout patterns 202. In some embodiments, each gatelayout pattern 204 a, 204 b,. . . , 204 l of the second set of gatelayout patterns 204 contacts a corresponding gate layout pattern 202 a,202 b,. . . , 202 l of the first set of gate layout patterns 202.

In some embodiments, each gate layout pattern 202 a, 202 b,. . . , 202 lof the first set of gate layout patterns 202 or each gate layout pattern204 a, 204 b,. . . , 204 l of the second set of gate layout patterns 204has a corresponding pattern width W_(1H) in the first direction X. Otherconfigurations or quantities of patterns in the first set of gate layoutpatterns 202 or the second set of gate layout patterns 204 are withinthe scope of the present disclosure.

Poly cut feature layout pattern 210 extends in the first direction X.Poly cut feature layout pattern 210 has a pattern width W_(1V) in thesecond direction Y, and a pattern length L in the first direction X. Insome embodiments, the poly cut feature layout pattern 210 is usable toidentify a location of at least a portion of gate structure 108 of IC100B that is removed during operation 606 of method 600 (FIG. 6).

In some embodiments, the pattern width Wiv corresponds to the cut widthD_(V) of one or more of gate structure 102 a, 102 b,. . . , 102 l orgate structure 104 a, 104 b,. . . , 104 l.

In some embodiments, the pattern width W_(1H) of each gate layoutpattern 202 a, 202 b,. . . , 202 l corresponds to the cut width D_(H) ofeach corresponding gate structure 102 a, 102 b,. . . , 102 l. In someembodiments, the pattern width W_(1H) of each gate layout pattern 204 a,204 b,. . . , 204 l corresponds to the cut width D_(H) of eachcorresponding gate structure 104 a, 104 b,. . . , 104 l.

In some embodiments, the pattern length L is greater than a sum of thepattern width W_(1H) of each gate layout pattern 202 a, 202 b,. . . ,202 l in the first of gate layout patterns 202 or gate layout pattern204 a, 204 b,. . . , 204 l in the second of gate layout patterns 204.

In some embodiments, the first set of gate layout patterns 202, thesecond set of gate layout patterns 204, and the poly cut feature layoutpattern 210 are located on a poly-gate layout level (POLY). Otherconfigurations or quantities of patterns in the poly cut feature layoutpattern 210 are within the scope of the present disclosure.

In some embodiments, a distance between layout patterns in the first setof gate layout patterns 202 and layout patterns in the second set ofgate layout patterns 204 is smaller than other approaches, causing anarea of layout design 200-300 or 500 to be smaller than otherapproaches. In some embodiments, by placing the first set of gate layoutpatterns 202 and the second set of gate layout patterns 204 closertogether than other approaches results in a layout design 200-300 or 500with more uniform gate pattern density causing less dishing fromchemical mechanical planarization (CMP) processes than other approaches.In some embodiments, by placing the first set of gate layout patterns202 and the second set of gate layout patterns 204 closer together thanother approaches results in a layout design 200-300 or 500 with moreuniform gate pattern density causing less polysilicon stitching thanother approaches.

FIG. 3 is a diagram of a layout design 300 of an IC, in accordance withsome embodiments. Layout design 300 is usable to manufacture IC 100A(FIG. 1A) or 100B (FIG. 1B).

Layout design 300 is a variation of layout design 200 (FIG. 2). Incomparison with layout design 200 of FIG. 2, layout design 300 furtherincludes one or more active region layout patterns 316 a, 316 b, 316 c(collectively referred to as “set of active region layout patterns 316”)each extending in the first direction X, and having a length L2 (notshown) in the second direction Y. The set of active region layoutpatterns 316 is below the first set of gate layout patterns 202 and thesecond set of gate layout patterns 204. Set of active region layoutpatterns 316 is usable to manufacture a corresponding set of activeregions (not shown) of IC 100A, 100B. In some embodiments, set of activeregions (not shown) of IC 100A, 100B, 400 is referred to as anoxide-definition (OD) region of IC 100A, 100B, 400 which defines thesource or drain diffusion regions of IC 100A, 100B, 400. In someembodiments, one or more active region layout patterns (not shown) oflayout design 200, 300 or 500 is referred to as one or more OD layoutpatterns of layout design 200, 300 or 500 which defines the source ordrain diffusion layout patterns of layout design 200, 300 or 500. Eachlayout pattern 316 a, 316 b, 316 c of the set of active region layoutpatterns 316 is separated from each other in the second direction Y.

Active region layout pattern 316 a is separated from active regionlayout pattern 316 b by a distance D2. In some embodiments, activeregion layout pattern 316 a and active region layout pattern 316 b arepart of the same active region layout pattern. In some embodiments,active region layout pattern 316 c includes two or more discontinuousactive region layout patterns. In some embodiments, active region layoutpattern 316 a, 316 b, and 316 c are part of a same, continuous activeregion layout pattern. Other configurations or quantities of patterns inthe set of active region layout patterns 316 are within the scope of thepresent disclosure.

Layout design 300 further includes one or more fin layout patterns 320a, 320 b, 320 c (collectively referred to as “set of fin layout patterns320”) each extending in the first direction X. Fin layout patterns 320a, 320 b, 320 c are over corresponding active region layout pattern 316a, 316 b, 316 c. The set of fin layout patterns 320 are below the firstset of gate layout patterns 202 and the second set of gate layoutpatterns 204. Each of the layout patterns of the set of fin layoutpatterns 320 is separated from an adjacent layout pattern of the set offin layout patterns 320 in the second direction Y by a fin pitch (notshown). The set of fin layout patterns 320 is usable to manufacture acorresponding set of fins (not shown) of IC 100A-100B. Otherconfigurations or quantities of fins in the set of fin layout patterns320 are within the scope of the present disclosure.

Layout design 300 further includes one or more conductive feature layoutpatterns 312 a, 312 b,. . . , 312 k (collectively referred to as a “setof conductive feature layout patterns 312”) each extending in the seconddirection Y. The set of conductive feature layout patterns 312 is abovethe set of active region layout patterns 316. In some embodiments, setof conductive feature layout patterns 312 corresponds to a first set ofmetal diffusion (MD) layout patterns. Set of conductive feature layoutpatterns 312 is usable to manufacture a corresponding first set of MDconductive features (not shown) on the metal-zero (MO) layer of IC 100A,100B. In some embodiments, the first set of MD conductive features (notshown) of IC 100A, 100B are connected to source or drain diffusionregions of IC 100A, 100B.

Each layout pattern 312 a, 312 b,. . . , 312 k of the set of conductivefeature layout patterns 312 extends in the second direction Y, and isseparated from each other in the first direction X. In some embodiments,a center of each layout pattern of the set of conductive feature layoutpatterns 312 is separated from a center of an adjacent layout pattern ofthe set of conductive feature layout patterns 312 in the first directionX by a pitch P2. Each layout pattern of the set of conductive featurelayout patterns 312 is positioned between a pair of layout patterns ofthe first set of gate layout patterns 202. Each layout pattern of theset of conductive feature layout patterns 312 is positioned between apair of gridlines of the set of gridlines 106. Other configurations orquantities of patterns in the set of conductive feature layout patterns312 are within the scope of the present disclosure.

Layout design 300 further includes one or more conductive feature layoutpatterns 314 a, 314 b,. . . , 314 k (collectively referred to as a “setof conductive feature layout patterns 314”) each extending in the seconddirection Y. The set of conductive feature layout patterns 314 is abovethe set of active region layout patterns 316. In some embodiments, setof conductive feature layout patterns 314 corresponds to a second set ofMD layout patterns. Set of conductive feature layout patterns 314 isusable to manufacture a corresponding second set of MD conductivefeatures (not shown) on the M0 layer of IC 100A, 100B. In someembodiments, the second set of MD conductive features (not shown) of IC100A, 100B are connected to source or drain diffusion regions of IC100A, 100B.

Each layout pattern 314 a, 314 b,. . . , 314 k of the set of conductivefeature layout patterns 314 extends in the second direction Y, and isseparated from each other in the first direction X. In some embodiments,a center of each layout pattern of the set of conductive feature layoutpatterns 314 is separated from a center of an adjacent layout pattern ofthe set of conductive feature layout patterns 314 in the first directionX by pitch P2. Each layout pattern of the set of conductive featurelayout patterns 314 is positioned between a pair of layout patterns ofthe second set of gate layout patterns 204. Each layout pattern of theset of conductive feature layout patterns 314 is positioned between apair of gridlines of the set of gridlines 106. Other configurations orquantities of patterns in the set of conductive feature layout patterns314 are within the scope of the present disclosure.

Each layout pattern 312 a, 312 b,. . . , 312 k of the set of conductivefeature layout patterns 312 is aligned with and separated from acorresponding conductive feature layout pattern 314 a, 314 b,. . . , 314k of the set of conductive feature layout patterns 314 in the seconddirection Y.

In some embodiments, an edge of layout pattern 312 a, 312 b,. . . , 312k of the set of conductive feature layout patterns 312 is aligned in thesecond direction Y with an edge of a corresponding layout pattern 314 a,314 b,. . . , 314 k of the set of conductive feature layout patterns314.

In some embodiments, a center of layout pattern 312 a, 312 b,. . . , 312k of the set of conductive feature layout patterns 312 is aligned in thesecond direction Y with a center of a corresponding layout pattern 314a, 314 b,. . . , 314 k of the set of conductive feature layout patterns314.

In some embodiments, each layout pattern 312 a, 312 b,. . . , 312 k ofthe set of conductive feature layout patterns 312 is separated in thesecond direction Y from a corresponding layout pattern 314 a, 314 b,. .. , 314 k of the set of conductive feature layout patterns 314 by atleast the pattern width Wiy.

In some embodiments, a distance between layout patterns in the first setof gate layout patterns 202 and layout patterns in the second set ofgate layout patterns 204 is smaller than other approaches, causing anarea of the set of active region layout patterns 316 and correspondingactive regions of the set of active regions (not shown) to be largerthan other approaches yielding an IC with better performance than otherapproaches.

FIG. 4 is a top view of a portion of an IC 400, in accordance with someembodiments.

IC 400 is a variation of IC 100A-100B of FIGS. 1A-1B. IC 400 includes afirst set of gate structures 402 and a second set of gate structures404. In some embodiments, IC 400 corresponds to an integrated circuitafter operation 604 in method 600 (FIG. 6).

In some embodiments, the first set of gate structures 402 corresponds toone or more gates of functional transistor devices. In some embodiments,the second set of gate structures 404 corresponds to one or more gatesof non-functional transistor devices. In some embodiments,non-functional transistor devices are referred to as dummy transistordevices. In some embodiments, the second set of gate structures 404 arereferred to as dummy gates.

The first set of gate structures 402 includes a first sub-set of gatestructures 402 a and a second sub-set of gate structures 402 b. Thefirst set of gate structures 402 is similar to the first set of gatestructures 102 of FIGS. 1A-1B, and similar detailed description istherefore omitted.

The first sub-set of gate structures 402 a includes one or more of gatestructures 408 a, 408 b, 408 c. Each gate structure 408 a, 408 b, 408 cof the first sub-set of gate structures 402 a is separated from anadjacent gate structure of the first sub-set of gate structures 402 a inthe first direction X by a distance S3. Each gate structure 408 a, 408b, 408 c of the first sub-set of gate structures 402 a extends in thesecond direction Y. Each gate structure 408 a, 408 b, 408 c of the firstsub-set of gate structures 402 a overlaps a corresponding gridline 412a, 412 b, 412 c (collectively referred to as “first sub-set of gridlines406 a”).

The second sub-set of gate structures 402 b includes one or more of gatestructures 410 a, 410 b, 410 c. Each gate structure 410 a, 410 b, 410 cof the second sub-set of gate structures 402 b is separated from anadjacent gate structure of the second sub-set of gate structures 402 bin the first direction X by a distance S4. Each gate structure 410 a,410 b, 410 c of the second sub-set of gate structures 402 b extends inthe second direction Y. Each gate structure 410 a, 410 b, 410 c of thesecond sub-set of gate structures 402 b overlaps a correspondinggridline 414 a, 414 b, 414 c (collectively referred to as “secondsub-set of gridlines 406 b”).

A first set of gridlines 406 includes the first sub-set of gridlines 406a and the second sub-set of gridlines 406 b. In some embodiments, thefirst sub-set of gridlines 406 a defines regions where gate structuresin the first sub-set of gate structures 402 a are positioned. In someembodiments, the second sub-set of gridlines 406 b defines regions wheregate structures in the second sub-set of gate structures 402 b arepositioned. Each gridline of the first sub-set of gridlines 406 a isseparated from an adjacent gridline of the first sub-set of gridlines406 a by a pitch P2. Each gridline of the second sub-set of gridlines406 b is separated from an adjacent gridline of the second sub-set ofgridlines 406 b by a pitch P3. The first set of gridlines 406 is similarto set of gridlines 106 of FIGS. 1A-1B, and similar detailed descriptionis therefore omitted.

The second set of gate structures 404 is positioned between the firstsub-set of gate structures 402 a and the second sub-set of gatestructures 402 b. In some embodiments, the first set of gate structures402 alternate with the second set of gate structures 404 in the firstdirection X. The second set of gate structures 404 is similar to the setof gate structures 104 of FIGS. 1A-1B, and similar detailed descriptionis therefore omitted. The second set of gate structures 404 includes oneor more of gate structures 404 a, 404 b, 404 q. In some embodiments, thesecond set of gate structures 404 includes 10 or more gate structures.

Each gate structure 404 a, 404 b, 404 q of the second set of gatestructures 404 is separated from an adjacent gate structure of thesecond set of gate structures 404 in the first direction X by a distanceS5. Each gate structure 404 a, 404 b, 404 q of the second set of gatestructures 404 extends in the second direction Y. Each gate structure404 a, 404 b, 404 q of the second set of gate structures 404 overlaps acorresponding gridline 416 a, 416 b, 416 q (collectively referred to as“second set of gridlines 406”). In some embodiments, the second set ofgridlines 416 defines regions where gate structures in the second set ofgate structures 404 are positioned. Each gridline of the second set ofgridlines 416 is separated from an adjacent gridline of the second setof gridlines 416 by a pitch P4. The second set of gridlines 416 issimilar to set of gridlines 106 of FIGS. 1A-1B, and similar detaileddescription is therefore omitted.

Other configurations or quantities of gate structures in the firstsub-set of gate structures 402 a, gate structures in the second sub-setof gate structures 402 b, gate structures in the second set of gatestructures 404 is within the contemplated scope of the presentdisclosure.

Other configurations or quantities of gridlines in the first sub-set ofgridlines 406 a, gridlines in the second sub-set of gridlines 406 b, orgridlines in the second set of gridlines 416 is within the contemplatedscope of the present disclosure.

In some embodiments, a side of each gate structure of the first set ofgate structures 402 is aligned in the first direction X with a side ofeach gate structure of the second set of gate structures 404.

In some embodiments, at least one of distance S3, S4 or S5 is equal toanother distance of distance S3, S4 or S5. In some embodiments, at leastone of distance S3, S4 or S5 is different from another distance ofdistance S3, S4 or S5.

In some embodiments, at least one of pitch P2, P3 or P4 is equal toanother pitch of pitch P2, P3 or P4. In some embodiments, at least oneof pitch P2, P3 or P4 is different from another pitch of pitch P2, P3 orP4.

In some embodiments, a gate structure 408 c of the first sub-set of gatestructures 402 a is directly next to or adjacent to a gate structure 404a of the second set of gate structures 404, and is separated from gatestructure 404 a of the second set of gate structures 404 in the firstdirection X by distance S3 or S5. In some embodiments, a gate structure410 a of the second sub-set of gate structures 402 b is directly next toor adjacent to a gate structure 404 q of the second set of gatestructures 404, and is separated from gate structure 404 q of the secondset of gate structures 404 in the first direction X by distance S4 orS5.

In some embodiments, a gridline 412 a, 412 b, 412 c is aligned in thesecond direction Y with a center or an edge of a corresponding gatestructure 408 a, 408 b, 408 c of the first sub-set of gate structures402 a.

In some embodiments, a gridline 414 a, 414 b, 414 c is aligned in thesecond direction Y with a center or an edge of a corresponding gatestructure 410 a, 410 b, 410 c of the second sub-set of gate structures402 b.

In some embodiments, a gridline 416 a, 416 b, 416 q is aligned in thesecond direction Y with a center or an edge of a corresponding gatestructure 404 a, 404 b, 404 q of the second set of gate structures 404.

In some embodiments, a gridline 412 a, 412 b, 412 c, 414 a, 414 b, 414c, 416 a, 416 b, 416 q is offset in the first direction X with a centerof a corresponding gate structure 408 a, 408 b, 408 c, 410 a, 410 b, 410c, 404 a, 404 b, 404 q by a first distance (not shown), and anothergridline 412 a, 412 b, 412 c, 414 a, 414 b, 414 c, 416 a, 416 b, 416 qis offset in the first direction X with a center of the correspondinggate structure 408 a, 408 b, 408 c, 410 a, 410 b, 410 c, 404 a, 404 b,404 q by a second distance (not shown). In these embodiments, the firstdistance (not shown) is the same as the second distance (not shown). Inthese embodiments, the first distance (not shown) is different from thesecond distance (not shown).

In some embodiments, at least one gate structure of the first set ofgate structures 402 or at least one gate structure of the second set ofgate structures 404 comprises polysilicon, or the like.

FIG. 5 is a diagram of a layout design 500 of an IC, in accordance withsome embodiments. Layout design 500 is usable to manufacture IC 400 ofFIG. 4. Structural relationships including alignment, lengths andwidths, as well as configurations of layout design 500 are similar tothe structural relationships and configurations of IC 400 of FIG. 400,and will not be described for brevity.

Layout design 500 includes a first set of gate layout patterns 502 and asecond set of gate layout patterns 504. The first set of gate layoutpatterns 502 is usable to manufacture a corresponding first set of gatestructures 402 (FIG. 4) of IC 400. The second set of gate layoutpatterns 504 is usable to manufacture a corresponding second set of gatestructures 404 (FIG. 4) of IC 400.

The first set of gate layout patterns 502 extend in the second directionY and overlap the set of gridlines 412 and 414. The first set of gatelayout patterns 502 includes a first sub-set of gate layout patterns 502a and a second sub-set of gate layout patterns 502 b. The first sub-setof gate layout patterns 502 a is usable to manufacture a correspondingfirst set of gate structures 402 a (FIG. 4) of IC 400. The secondsub-set of gate layout patterns 502 b is usable to manufacture acorresponding second set of gate structures 402 b (FIG. 4) of IC 400.The first set of gate layout patterns 502 is similar to the first set ofgate layout patterns 202 of FIGS. 2-3, and similar detailed descriptionis therefore omitted.

The first sub-set of gate layout patterns 502 a includes one or more ofgate layout patterns 508 a, 508 b, 508 c. Each gate layout pattern 508a, 508 b, 508 c of the first sub-set of gate layout patterns 502 a isseparated from an adjacent gate layout pattern of the first sub-set ofgate layout patterns 502 a in the first direction X by a distance S6.Each gate layout pattern 508 a, 508 b, 508 c of the first sub-set ofgate layout patterns 502 a extends in the second direction Y. Each gatelayout pattern 508 a, 508 b, 508 c of the first sub-set of gate layoutpatterns 502 a overlaps a corresponding gridline 412 a, 412 b, 412 c.

The second sub-set of gate layout patterns 502 b includes one or more ofgate layout patterns 510 a, 510 b, 510 c. Each gate layout pattern 510a, 510 b, 510 c of the second sub-set of gate layout patterns 502 b isseparated from an adjacent gate layout pattern of the second sub-set ofgate layout patterns 502 b in the first direction X by a distance S7.Each gate layout pattern 510 a, 510 b, 510 c of the second sub-set ofgate layout patterns 502 b extends in the second direction Y. Each gatelayout pattern 510 a, 510 b, 510 c of the second sub-set of gate layoutpatterns 502 b overlaps a corresponding gridline 414 a, 414 b, 414 c.

In some embodiments, the first sub-set of gridlines 406 a definesregions where gate layout patterns in the first sub-set of gate layoutpatterns 502 a are positioned. In some embodiments, the second sub-setof gridlines 406 b defines regions where gate layout patterns in thesecond sub-set of gate layout patterns 502 b are positioned.

The second set of gate layout patterns 504 extend in the seconddirection Y and overlap the set of gridlines 416. The first set of gatelayout patterns 502 and second set of gate layout patterns 504 areseparated from each other in the first direction X by a distance S6, S7or S8.

The second set of gate layout patterns 504 is positioned between thefirst sub-set of gate layout patterns 502 a and the second sub-set ofgate layout patterns 502 b. In some embodiments, the first set of gatelayout patterns 502 alternate with the second set of gate layoutpatterns 504 in the first direction X. The second set of gate layoutpatterns 504 is similar to the set of gate layout patterns 204 of FIGS.2-3, and similar detailed description is therefore omitted. The secondset of gate layout patterns 504 includes one or more of gate layoutpatterns 504 a, 504 b, 504 q. In some embodiments, the second set ofgate layout patterns 504 includes 10 or more gate layout patterns.

Each gate layout pattern 504 a, 504 b, 504 q of the second set of gatelayout patterns 504 is separated from an adjacent gate layout pattern ofthe second set of gate layout patterns 504 in the first direction X by adistance S8. Each gate layout pattern 504 a, 504 b, 504 q of the secondset of gate layout patterns 504 extends in the second direction Y. Eachgate layout pattern 504 a, 504 b, 504 q of the second set of gate layoutpatterns 504 overlaps a corresponding gridline 416 a, 416 b, 416 q. Insome embodiments, the second set of gridlines 416 defines regions wheregate layout patterns in the second set of gate layout patterns 504 arepositioned.

In some embodiments, a side of each gate layout pattern of the first setof gate layout patterns 502 is aligned in the first direction X with aside of each gate layout pattern of the second set of gate layoutpatterns 504.

In some embodiments, at least one of distance S6, S7 or S8 is equal toanother distance of distance S6, S7 or S8. In some embodiments, at leastone of distance S6, S7 or S8 is different from another distance ofdistance S6, S7 or S8.

In some embodiments, at least one of pitch P2, P3, P4 or P5 is equal toanother pitch of pitch P2, P3, P4 or P5. In some embodiments, at leastone of pitch P2, P3, P4 or P5 is different from another pitch of pitchP2, P3, P4 or P5.

In some embodiments, a gate layout pattern 508 c of the first sub-set ofgate layout patterns 502 a is directly next to or adjacent to a gatelayout pattern 504 a of the second set of gate layout patterns 504, andis separated from gate layout pattern 504 a of the second set of gatelayout patterns 504 in the first direction X by distance S6 or S7. Insome embodiments, a gate layout pattern 510 a of the second sub-set ofgate layout patterns 502 b is directly next to or adjacent to a gatelayout pattern 504 q of the second set of gate layout patterns 504, andis separated from gate layout pattern 504 q of the second set of gatelayout patterns 504 in the first direction X by distance S7 or S8.

In some embodiments, a gridline 412 a, 412 b, 412 c is aligned in thesecond direction Y with a center or an edge of a corresponding gatelayout pattern 508 a, 508 b, 508 c of the first sub-set of gate layoutpatterns 502 a.

In some embodiments, a gridline 414 a, 414 b, 414 c is aligned in thesecond direction Y with a center or an edge of a corresponding gatelayout pattern 510 a, 510 b, 510 c of the second sub-set of gate layoutpatterns 502 b.

In some embodiments, a gridline 416 a, 416 b, 416 q is aligned in thesecond direction Y with a center or an edge of a corresponding gatelayout pattern 504 a, 504 b, 504 q of the second set of gate layoutpatterns 504.

In some embodiments, a gridline 412 a, 412 b, 412 c, 414 a, 414 b, 414c, 416 a, 416 b, 416 q is offset in the first direction X with a centerof a corresponding gate layout pattern 508 a, 508 b, 508 c, 510 a, 510b, 510 c, 504 a, 504 b, 504 q by a first distance (not shown), andanother gridline 412 a, 412 b, 412 c, 414 a, 414 b, 414 c, 416 a, 416 b,416 q is offset in the first direction X with a center of thecorresponding gate layout pattern 508 a, 508 b, 508 c, 510 a, 510 b, 510c, 504 a, 504 b, 504 q by a second distance (not shown). In theseembodiments, the first distance (not shown) is the same as the seconddistance (not shown). In these embodiments, the first distance (notshown) is different from the second distance (not shown).

Other configurations or quantities of gate layout patterns in the firstsub-set of gate layout patterns 502 a, gate layout patterns in thesecond sub-set of gate layout patterns 502 b or gate layout patterns inthe second set of gate layout patterns 504 is within the contemplatedscope of the present disclosure.

Layout design 500 further includes one or more active region layoutpatterns 516 a, 516 b, 516 c, 516 d, 516 d (collectively referred to as“set of active region layout patterns 516”) each extending in the firstdirection X. The set of active region layout patterns 516 is below thefirst set of gate layout patterns 502 and the second set of gate layoutpatterns 504. Set of active region layout patterns 516 is usable tomanufacture a corresponding set of active regions (not shown) of IC 400.In some embodiments, set of active regions (not shown) of IC 400 isreferred to as an OD region of IC 400 which defines the source or draindiffusion regions of IC 400. Each layout pattern 516 a, 516 b, 516 c,516 d of the set of active region layout patterns 516 is separated fromeach other in the first direction X.

An edge of active region layout pattern 516 a is separated from a firstedge of active region layout pattern 516 b by a distance D3. A secondedge of active region layout pattern 516 b is separated from a firstedge of active region layout pattern 516 c by a distance D4. A secondedge of active region layout pattern 516 c is separated from an edge ofactive region layout pattern 516 d by a distance D5. In someembodiments, at least one of distance D3, D4 or D5 is equal to anotherdistance of distances D3, D4 or D5. In some embodiments, at least one ofdistance D3, D4 or D5 is different from another distance of distancesD3, D4 or D5. In some embodiments, at least two patterns of activeregion layout pattern 516 a, 516 b, 516 c, 516 d are part of a same,continuous active region layout pattern in the set of active regionlayout patterns 516. In some embodiments, at least one pattern of activeregion layout pattern 516 a, 516 b, 516 c, 516 d includes two or morediscontinuous active region layout patterns. Other configurations orquantities of patterns in the set of active region layout patterns 516are within the scope of the present disclosure.

Layout design 500 further includes one or more fin layout patterns 520a, 520 b, 520 c, 520 d (collectively referred to as “set of fin layoutpatterns 520”) each extending in the first direction X. The set of finlayout patterns 520 are below the first set of gate layout patterns 502and the second set of gate layout patterns 504. Fin layout patterns 520a, 520 b, 520 c, 520 d are over corresponding active region layoutpattern 516 a, 516 b, 516 c, 516 d. Each of the layout patterns of theset of fin layout patterns 520 is separated from an adjacent layoutpattern of the set of fin layout patterns 520 in the first direction X.The set of fin layout patterns 520 is usable to manufacture acorresponding set of fins (not shown) of IC 400. Other configurations orquantities of fins in the set of fin layout patterns 520 are within thescope of the present disclosure.

Layout design 500 further includes one or more conductive feature layoutpatterns 522 a, 522 b, 522 q (collectively referred to as a “set ofconductive feature layout patterns 522”) each extending in the firstdirection X. The set of conductive feature layout patterns 522 is abovethe set of active region layout patterns 516. In some embodiments, setof conductive feature layout patterns 522 corresponds to a set of MDlayout patterns. Set of conductive feature layout patterns 522 is usableto manufacture a corresponding set of MD conductive features (not shown)on the MO layer of IC 400. In some embodiments, the first set of MDconductive features (not shown) of IC 400 are connected to source ordrain diffusion regions of IC 400.

Each layout pattern 522 a, 522 b, . . . , 522 q of the set of conductivefeature layout patterns 522 extends in the second direction Y, and isseparated from each other in the first direction X. In some embodiments,a center of each layout pattern of the set of conductive feature layoutpatterns 522 is separated from a center of an adjacent layout pattern ofthe set of conductive feature layout patterns 522 in the first directionX by a pitch P5.

Each layout pattern of the set of conductive feature layout patterns 522is positioned between a pair of layout patterns of the first set of gatelayout patterns 502 and the second set of gate layout patterns 504. Eachlayout pattern of the set of conductive feature layout patterns 522 ispositioned between a pair of gridlines of the first set of gridlines 406and the second set of gridlines 416. In some embodiments, an edge of atleast one layout pattern 522 a, 522 b, . . . , 522 v of the set ofconductive feature layout patterns 522 is aligned in the first directionX with at least an edge of another layout pattern 522 a, 522 b, . . . ,522 v of the set of conductive feature layout patterns 522. Otherconfigurations or quantities of patterns in the set of conductivefeature layout patterns 522 are within the scope of the presentdisclosure.

In some embodiments, a distance between layout patterns in the firstsub-set of gate layout patterns 502 a and layout patterns in the secondset of gate layout patterns 504 is smaller than other approaches causingan area of layout design 500 to be smaller than other approaches. Insome embodiments, by placing the first sub-set of gate layout patterns502 a and layout patterns in the second set of gate layout patterns 504closer together than other approaches results in a layout design 500with more uniform gate pattern density causing less dishing from CMPprocesses than other approaches. In some embodiments, by placing thefirst sub-set of gate layout patterns 502 a and layout patterns in thesecond set of gate layout patterns 504 closer together than otherapproaches results in a layout design 500 with less polysiliconstitching than other approaches. In some embodiments, a distance betweenlayout patterns in the second sub-set of gate layout patterns 502 b andlayout patterns in the second set of gate layout patterns 504 is smallerthan other approaches causing an area of layout design 500 to be smallerthan other approaches. In some embodiments, by placing the secondsub-set of gate layout patterns 502 b and layout patterns in the secondset of gate layout patterns 504 closer together than other approachesresults in a layout design 500 with more uniform gate pattern densitycausing less dishing from CMP processes than other approaches. In someembodiments, by placing the second sub-set of gate layout patterns 502 band layout patterns in the second set of gate layout patterns 504 closertogether than other approaches results in a layout design 500 with lesspolysilicon stitching than other approaches. In some embodiments, adistance between layout patterns in the first sub-set of gate layoutpatterns 502 a and layout patterns in the second sub-set of gate layoutpatterns 502 b is smaller than other approaches causing an area oflayout design 500 to be smaller than other approaches. In someembodiments, by placing the first sub-set of gate layout patterns 502 aand layout patterns in the second sub-set of gate layout patterns 502 bcloser together than other approaches results in a layout design 500with more uniform gate pattern density causing less dishing from CMPprocesses than other approaches. In some embodiments, by placing thefirst sub-set of gate layout patterns 502 a and layout patterns in thesecond sub-set of gate layout patterns 502 b closer together than otherapproaches results in a layout design 500 with less polysiliconstitching than other approaches. In some embodiments, a distance betweentwo layout patterns in the first sub-set of gate layout patterns 502 a,the second sub-set of gate layout patterns 504 b and the second set ofgate layout patterns 504 is smaller than other approaches causing anarea of set of active region layout patterns 516 and correspondingactive regions of the set of active regions (not shown) to be largerthan other approaches yielding an IC with better performance than otherapproaches.

FIG. 6 is a flowchart of a method 600 of forming an integrated circuitin accordance with some embodiments. It is understood that additionaloperations may be performed before, during, and/or after the method 600depicted in FIG. 6, and that some other processes may only be brieflydescribed herein. In some embodiments, the method 600 is usable to formintegrated circuits, such as IC 100A (FIG. 1A) or integrated circuit 400(FIG. 4).

In operation 602 of method 600, a layout design 200 (FIG. 2) of anintegrated circuit (e.g., IC 100A or 100B (FIGS. 1A-1B)) is generated.Operation 602 is performed by a processing device (e.g., processor 802(FIG. 8)) configured to execute instructions for generating a layoutdesign (e.g., layout design 200). In some embodiments, the layout design200 is a graphic database system (GDSII) file format. In someembodiments, operation 602 of method 600 is utilized to generate alayout design 300 (FIG. 3) or layout design 500 (FIG. 5). In someembodiments, operation 602 of method 600 generates one or more layoutdesigns having a first set of gate layout patterns and a second set ofgate layout patterns closer together than other approaches resulting inthe one or more layout designs having a more uniform gate patterndensity than other approaches. In some embodiments, operation 602 ofmethod 600 generates one or more layout designs having one or more ofthe advantages described in FIG. 2-3 or 5, and similar detaileddescription is therefore omitted.

Method 600 continues with operation 604, where the integrated circuit(e.g., IC 100B (FIG. 1B)) is manufactured based on the layout design 200(FIG. 2). In some embodiments, IC 100B (FIG. 1B) includes gate structure108. In some embodiments, the gate structure 108 is located on gate orpoly layer (PO) of IC 100A or 100B. In some embodiments, operation 604comprises manufacturing at least one mask based on the layout design 200(FIG. 2), and manufacturing the integrated circuit (e.g., IC 100B (FIG.1B)) based on the at least one mask.

Method 600 continues with operation 606, where gate structure 108 (gatestructure 108 a, 108 b, . . . , 108 l) is removed thereby forming afirst gate structure (e.g., gate structure 102 a, 102 b, . . . , 102 l)and a second gate structure (e.g., gate structures 104 a, 104 b, . . . ,104 l) of integrated circuit (e.g., IC 100A (FIG. 1A)). In someembodiments, the removed portion of the gate structure 108 (gatestructure 108 a, 108 b, . . . , 108 l) corresponds to a cut region(e.g., poly cut feature layout pattern 210 (FIG. 2)). In someembodiments, operation 606 of method 600 is referred to as a cut-poly(CPO) process. In some embodiments, operation 606 results in theformation of IC 100A (FIG. 1A).

In some embodiments, the portion of the gate structure 108 that isremoved in operation 606 is identified in layout designs 200 and 300 bypoly cut feature layout pattern 210 (FIGS. 2-3). In some embodiments,the poly cut feature layout pattern 210 identifies a location of theremoved portion of the gate structure 108 of IC 100B.

In some embodiments, the removed portion of each gate 108 a, 108 b, . .. , 108 l comprises cut width D_(V) (FIG. 1) in second direction Y, andcut length D_(H) (FIG. 1) in first direction X. In some embodiments, thepoly cut feature layout pattern 210 (FIG. 2) comprises a pattern widthW_(1V) in the second direction Y, and a pattern length L in the firstdirection X. In some embodiments, the pattern width W_(1V) correspondsto the cut width D_(V) of each gate structure 102 a, 102 b, . . . , 102l or gate structure 104 a, 104 b, . . . , 104 l.

In some embodiments, the pattern width W_(1H) of each gate layoutpattern 202 a, 202 b, . . . , 202 l corresponds to the cut width D_(H)of each corresponding gate structure 102 a, 102 b, . . . , 102 l. Insome embodiments, the pattern width Wm of each gate layout pattern 204a, 204 b, . . . , 204 l corresponds to the cut width DH of eachcorresponding gate structure 104 a, 104 b, . . . , 104 l.

In some embodiments, operation 606 of method 600 is performed on gatestructures in IC 100A that are not sufficiently separated from eachother in the second direction Y to ensure a consistent manufacturedyield. For example, in these embodiments, if the distance D_(V) betweengate structure 102 a, 102 b, . . . , 102 l and corresponding gatestructure 104 a, 104 b, . . . , 104 l in the second direction Y is lessthan a minimum distance (e.g., dependent upon manufacturing process),then gate structure 102 a, 102 b, . . . , 102 l and corresponding gatestructure 104 a, 104 b, . . . , 104 l are not sufficiently separatedfrom each other to ensure a consistent manufactured yield, and thereforeoperation 606 of method 600 is applied to ensure sufficient separationbetween gate structure 102 a, 102 b, . . . , 102 l and correspondinggate structure 104 a, 104 b, . . . , 104 l. The minimum distance is theminimum spacing between conductive structures manufactured to ensure aconsistent yield.

In some embodiments, if the distance Dv between gate structure 102 a,102 b, . . . , 102 l and corresponding gate structure 104 a, 104 b, . .. , 104 l in the second direction Y is greater than a minimum distance(e.g., dependent upon manufacturing process), then operation 606 ofmethod 600 is not performed (e.g., optional) on gate structure 102 a,102 b, . . . , 102 l and corresponding gate structure 104 a, 104 b, . .. , 104 l.

In some embodiments, the area of the cut feature layout pattern (e.g.,poly cut feature layout pattern 210) is less than or equal to an area ofthe removed portion of the gate structure 108 of IC 100B. In someembodiments, the area of the removed portion of the gate structure 108of IC 100B is based upon the cut width D_(V) and the cut length D_(H) ofeach corresponding gate structure 102 a, . . . , 102 l or 104 a, . . . ,104 l. In some embodiments, the area of the cut feature layout pattern(e.g., poly cut feature layout pattern 210) is greater than the area ofthe removed portion of the gate structure 108 of IC 100B.

In some embodiments, operation 606 is performed by a removal process. Insome embodiments, the removal process includes one or more etchingprocesses suitable to remove a portion of gate structure 108. In someembodiments, the etching process of operation 606 includes identifying aportion of the gate structure 108 that is to be removed, and etching theportion of the gate structure 108 that is to be removed. In someembodiments, a mask is used to specify portions of the gate structure108 that are to be cut or removed. In some embodiments the mask is ahard mask. In some embodiments, the mask is a soft mask. In someembodiments, etching corresponds to plasma etching, reactive ionetching, chemical etching, dry etching, wet etching, other suitableprocesses, any combination thereof, or the like. In some embodiments,operation 604 or 606 of method 600 is useable to manufacture one or moreintegrated circuits having one or more of the advantages described inFIGS. 1A-1B or 4, and similar detailed description is therefore omitted.

In some embodiments, method 600 is utilized with layout designs otherthan layout design 200. For example, in some embodiments, layout design200 (FIG. 2) of operation 602 or 604 is replaced with one or more oflayout design 300 (FIG. 3) or layout design 500 (FIG. 5). In someembodiments, layout design 200 of operations 602 and 604 is replacedwith layout design 300 (FIG. 3) to manufacture IC 100B (FIG. 1B). Insome embodiments, layout design 200 of operations 602 and 604 isreplaced with layout design 500 (FIG. 5) to manufacture integratedcircuit 400 (FIG. 4).

In some embodiments, operation 606 is not performed. For example, insome embodiments, operation 606 is not performed to manufactureintegrated circuit 400 (FIG. 4). In some embodiments, method 600 isperformed to manufacture integrated circuit 400 (FIG. 400) using layoutdesign 500, and operation 606 is not performed using integrated circuit400 (FIG. 4). In some embodiments, method 600 utilizes one or morelayout patterns with more regular gate layout patterns than otherapproaches yielding greater process control (e.g., etching) than otherapproaches. In some embodiments, method 600 utilizes one or more gatelayout patterns (e.g., first set of gate layout patterns 202, second setof gate layout patterns 204, first sub-set of gate layout patterns 502a, second sub-set of gate layout patterns 504 b or second set of gatelayout patterns 504) that are aligned with corresponding gridlines(e.g., gridlines 106, gridlines 406 or gridlines 416) in the firstdirection or the second direction yielding greater process control(e.g., etching) than other approaches.

FIG. 7 is a flowchart of a method 700 of generating a layout design ofan IC in accordance with some embodiments. It is understood thatadditional operations may be performed before, during, and/or after themethod 700 depicted in FIG. 7, and that some other processes may only bebriefly described herein. In some embodiments, the method 700 is usableto generate one or more layout designs, such as layout design 200 (FIG.2), layout design 300 (FIG. 3) or layout design 500 (FIG. 5) of anintegrated circuit, such as IC 100A-100B (FIG. 1) or integrated circuit400 (FIG. 4). In some embodiments, the method 700 is usable to formintegrated circuits having similar structural relationships as one ormore of layout designs 200-300 or 500 (FIG. 2-3 or 5). In someembodiments, method 700 is performed by a processing device (e.g.,processor 802 (FIG. 8)) configured to execute instructions forgenerating a layout design 200, 300 or 500.

In operation 702 of method 700, a set of active region layout patternsis generated. In some embodiments, the set of active region layoutpatterns of method 700 includes one or more patterns of the set ofactive region layout patterns 316 of FIG. 3 and set of active regionlayout patterns 516 of FIG. 5, and detailed description of these layoutpatterns is therefore omitted.

In operation 704 of method 700, the set of active region layout patternsis placed on a first layout level of the layout design 200, 300 or 500.In some embodiments, the first layout level corresponds to the OD layoutlevel.

In operation 706 of method 700, a set of fin layout patterns isgenerated. In some embodiments, the set of fin layout patterns of method700 includes one or more patterns of the set of fin layout patterns 320of FIG. 3 and set of fin layout patterns 520 of FIG. 5, and detaileddescription of these layout patterns is therefore omitted.

In operation 708 of method 700, the set of fin layout patterns is placedon a second layout level of layout design 200, 300 or 500. In someembodiments, the second layout level corresponds to the FIN layoutlevel. In some embodiments, the second layout level is different fromthe first layout level. In some embodiments, the second layout level isabove the first layout level. In some embodiments, the second layoutlevel is below the first layout level.

In operation 710 of method 700, a set of conductive feature layoutpatterns is generated. In some embodiments, the set of conductivefeature layout patterns of method 700 includes one or more patterns ofthe set of conductive feature layout patterns 312 of FIG. 3, set ofconductive feature layout pattern 314 of FIG. 3 and set of conductivefeature layout patterns 522 of FIG. 5, and detailed description of theselayout patterns is therefore omitted.

In operation 712 of method 700, the set of conductive feature layoutpatterns is placed on a third layout level of layout design 200, 300 or500. In some embodiments, the third layout level corresponds to the MDlayout level. In some embodiments the third layout level corresponds tothe MO layout level. In some embodiments, the third layout level isdifferent from the first layout level and the second layout level. Insome embodiments, the third layout level is above one or more of thefirst or second layout level. In some embodiments, the third layoutlevel is below one or more of the first or second layout level.

In operation 714 of method 700, a set of gate layout patterns isgenerated. In some embodiments, the set of gate layout patterns ofmethod 700 includes one or more patterns of the first set of gate layoutpatterns 202 of FIGS. 2-3, second set of gate layout pattern 204 ofFIGS. 2-3, first set of gate layout patterns 502 of FIG. 5, firstsub-set of gate layout patterns 502 a of FIG. 5, second sub-set of gatelayout patterns 502 b of FIG. 5 and second set of gate layout patterns504, and detailed description of these layout patterns is thereforeomitted.

In operation 716 of method 700, the set of gate layout patterns isplaced on a fourth layout level of layout design 200, 300 or 500. Insome embodiments, the fourth layout level corresponds to the Poly layoutlevel. In some embodiments, the fourth layout level is different fromthe first layout level, the second layout level and the third layoutlevel. In some embodiments, the fourth layout level is above one or moreof the first, second or third layout level. In some embodiments, thefourth layout level is below one or more of the first, second or thirdlayout level.

In operation 718 of method 700, a set of dummy gate layout patterns isgenerated. In some embodiments, the set of dummy gate layout patterns ofmethod 700 includes one or more patterns of the first set of gate layoutpatterns 202 of FIGS. 2-3, second set of gate layout pattern 204 ofFIGS. 2-3, first set of gate layout patterns 502 of FIG. 5, firstsub-set of gate layout patterns 502 a of FIG. 5, second sub-set of gatelayout patterns 502 b of FIG. 5 and second set of gate layout patterns504, and detailed description of these layout patterns is thereforeomitted.

In operation 720 of method 700, the set of dummy gate layout patterns isplaced on the fourth layout level of layout design 200, 300 or 500.

In operation 722 of method 700, a cut feature layout pattern isgenerated. In some embodiments, the cut feature layout pattern of method700 includes poly cut feature layout pattern 210 of FIGS. 2-3, anddetailed description of these layout patterns is therefore omitted.

In operation 724 of method 700, the cut feature layout pattern is placedon the fourth layout level of layout design 200, 300 or 500.

In some embodiments, one or more of operations 702, 704, 706, 708, 710,712, 714, 716, 718, 720, 722 or 724 of method 700 is not performed.

One or more of the operations of methods 600-700 is performed by aprocessing device configured to execute instructions for manufacturingan integrated circuit, such as IC 100A-100B or 400. In some embodiments,one or more operations of methods 600-700 is performed using a sameprocessing device as that used in a different one or more operations ofmethods 600-700. In some embodiments, a different processing device isused to perform one or more operations of methods 600-700 from that usedto perform a different one or more operations of methods 600-700. Insome embodiments, method 700 generates one or more layout designs havingone or more of the advantages described in FIG. 2-3 or 5, and similardetailed description is therefore omitted.

FIG. 8 is a schematic view of a system 800 for designing an IC layoutdesign in accordance with some embodiments. In some embodiments, system800 generates or places one or more IC layout designs described herein.System 800 includes a hardware processor 802 and a non-transitory,computer readable storage medium 804 encoded with, i.e., storing, thecomputer program code 806, i.e., a set of executable instructions.Computer readable storage medium 804 is configured for interfacing withmanufacturing machines for producing the integrated circuit. Theprocessor 802 is electrically coupled to the computer readable storagemedium 804 via a bus 808. The processor 802 is also electrically coupledto an I/O interface 810 by bus 808. A network interface 812 is alsoelectrically connected to the processor 802 via bus 808. Networkinterface 812 is connected to a network 814, so that processor 802 andcomputer readable storage medium 804 are capable of connecting toexternal elements via network 814. The processor 802 is configured toexecute the computer program code 806 encoded in the computer readablestorage medium 804 in order to cause system 800 to be usable forperforming a portion or all of the operations as described in method 600or 700. In some embodiments, system 900 includes an automatic placementand routing (APR) system.

In some embodiments, the processor 802 is a central processing unit(CPU), a multi-processor, a distributed processing system, anapplication specific integrated circuit (ASIC), and/or a suitableprocessing unit.

In some embodiments, the computer readable storage medium 804 is anelectronic, magnetic, optical, electromagnetic, infrared, and/or asemiconductor system (or apparatus or device). For example, the computerreadable storage medium 804 includes a semiconductor or solid-statememory, a magnetic tape, a removable computer diskette, a random accessmemory (RAM), a read-only memory (ROM), a rigid magnetic disk, and/or anoptical disk. In some embodiments using optical disks, the computerreadable storage medium 804 includes a compact disk-read only memory(CD-ROM), a compact disk-read/write (CD-R/W), and/or a digital videodisc (DVD).

In some embodiments, the storage medium 804 stores the computer programcode 806 configured to cause system 800 to perform method 600 or 700. Insome embodiments, the storage medium 804 also stores information neededfor performing method 600 or 700 as well as information generated duringperforming method 600 or 700, such as layout design 816, user interface818 and fabrication unit 820, and/or a set of executable instructions toperform the operation of method 600 or 700. In some embodiments, layoutdesign 816 comprises one or more of layout designs 200-300 or 500.

In some embodiments, the storage medium 804 stores instructions (e.g.,computer program code 806) for interfacing with manufacturing machines.The instructions (e.g., computer program code 806) enable processor 802to generate manufacturing instructions readable by the manufacturingmachines to effectively implement method 600 or 700 during amanufacturing process.

System 800 includes I/O interface 810. I/O interface 810 is coupled toexternal circuitry. In some embodiments, I/O interface 810 includes akeyboard, keypad, mouse, trackball, trackpad, and/or cursor directionkeys for communicating information and commands to processor 802.

System 800 also includes network interface 812 coupled to the processor802. Network interface 812 allows system 800 to communicate with network814, to which one or more other computer systems are connected. Networkinterface 812 includes wireless network interfaces such as BLUETOOTH,WIFI, WIMAX, GPRS, or WCDMA; or wired network interface such asETHERNET, USB, or IEEE-1394. In some embodiments, method 600 or 700 isimplemented in two or more systems 800, and information such as layoutdesign, user interface and fabrication unit are exchanged betweendifferent systems 800 by network 814.

System 800 is configured to receive information related to a layoutdesign through I/O interface 810 or network interface 812. Theinformation is transferred to processor 802 by bus 808 to determine alayout design for producing IC 100A-100B or 400. The layout design isthen stored in computer readable medium 804 as layout design 816. System800 is configured to receive information related to a user interfacethrough I/O interface 810 or network interface 812. The information isstored in computer readable medium 804 as user interface 818. System 800is configured to receive information related to a fabrication unitthrough I/O interface 810 or network interface 812. The information isstored in computer readable medium 804 as fabrication unit 820. In someembodiments, the fabrication unit 820 includes fabrication informationutilized by system 1000 (FIG. 10).

In some embodiments, method 600 or 700 is implemented as a standalonesoftware application for execution by a processor. In some embodiments,method 600 or 700 is implemented as a software application that is apart of an additional software application. In some embodiments, method600 or 700 is implemented as a plug-in to a software application. Insome embodiments, method 600 or 700 is implemented as a softwareapplication that is a portion of an EDA tool. In some embodiments,method 600 or 700 is implemented as a software application that is usedby an EDA tool. In some embodiments, the EDA tool is used to generate alayout of the integrated circuit device. In some embodiments, the layoutis stored on a non-transitory computer readable medium. In someembodiments, the layout is generated using a tool such as VIRTUOSO®available from CADENCE DESIGN SYSTEMS, Inc., or another suitable layoutgenerating tool. In some embodiments, the layout is generated based on anetlist which is created based on the schematic design. In someembodiments, method 600 or 700 is implemented by a manufacturing deviceto manufacture an integrated circuit (e.g., IC 100A-100B or 400) using aset of masks manufactured based on one or more layout designs (e.g.,layout design 200-300, or 500) generated by system 800. System 800 ofFIG. 8 generates one or more layout designs (e.g., layout design 200-300or 500) of an integrated circuit (e.g, IC 100A-100B or 400) that have asmaller area than other approaches.

FIG. 9 is a block diagram of an integrated circuit (IC) manufacturingsystem 900, and an IC manufacturing flow associated therewith, inaccordance with at least one embodiment of the present disclosure.

In FIG. 9, IC manufacturing system 900 includes entities, such as adesign house 920, a mask house 930, and an IC manufacturer/fabricator(“fab”) 940, that interact with one another in the design, development,and manufacturing cycles and/or services related to manufacturing an ICdevice 960. The entities in system 900 are connected by a communicationsnetwork. In some embodiments, the communications network is a singlenetwork. In some embodiments, the communications network is a variety ofdifferent networks, such as an intranet and the Internet. Thecommunications network includes wired and/or wireless communicationchannels. Each entity interacts with one or more of the other entitiesand provides services to and/or receives services from one or more ofthe other entities. In some embodiments, two or more of design house920, mask house 930, and IC fab 940 is owned by a single larger company.In some embodiments, two or more of design house 920, mask house 930,and IC fab 940 coexist in a common facility and use common resources.

Design house (or design team) 920 generates an IC design layout 922. ICdesign layout 922 includes various geometrical patterns designed for anIC device 960. The geometrical patterns correspond to patterns of metal,oxide, or semiconductor layers that make up the various components of ICdevice 960 to be fabricated. The various layers combine to form variousIC features. For example, a portion of IC design layout 922 includesvarious IC features, such as an active region, gate electrode, sourceelectrode and drain electrode, metal lines or vias of an interlayerinterconnection, and openings for bonding pads, to be formed in asemiconductor substrate (such as a silicon wafer) and various materiallayers disposed on the semiconductor substrate. Design house 920implements a proper design procedure to form IC design layout 922. Thedesign procedure includes one or more of logic design, physical designor place and route. IC design layout 922 is presented in one or moredata files having information of the geometrical patterns. For example,IC design layout 922 can be expressed in a GDSII file format or DFIIfile format.

Mask house 930 includes data preparation 952 and mask fabrication 944.Mask house 930 uses IC design layout 922 to manufacture one or moremasks to be used for fabricating the various layers of IC device 960according to IC design layout 922. Mask house 930 performs mask datapreparation 952, where IC design layout 922 is translated into arepresentative data file (“RDF”). Mask data preparation 952 provides theRDF to mask fabrication 944. Mask fabrication 944 includes a maskwriter. A mask writer converts the RDF to an image on a substrate, suchas a mask (reticle) or a semiconductor wafer. The design layout ismanipulated by mask data preparation 952 to comply with particularcharacteristics of the mask writer and/or requirements of IC fab 940. InFIG. 9, mask data preparation 952 and mask fabrication 944 areillustrated as separate elements. In some embodiments, mask datapreparation 952 and mask fabrication 944 can be collectively referred toas mask data preparation.

In some embodiments, mask data preparation 952 includes opticalproximity correction (OPC) which uses lithography enhancement techniquesto compensate for image errors, such as those that can arise fromdiffraction, interference, other process effects and the like. OPCadjusts IC design layout 922. In some embodiments, mask data preparation952 includes further resolution enhancement techniques (RET), such asoff-axis illumination, sub-resolution assist features, phase-shiftingmasks, other suitable techniques, and the like or combinations thereof.In some embodiments, inverse lithography technology (ILT) is also used,which treats OPC as an inverse imaging problem.

In some embodiments, mask data preparation 952 includes a mask rulechecker (MRC) that checks the IC design layout that has undergoneprocesses in OPC with a set of mask creation rules which contain certaingeometric and/or connectivity restrictions to ensure sufficient margins,to account for variability in semiconductor manufacturing processes, andthe like. In some embodiments, the MRC modifies the IC design layout tocompensate for limitations during mask fabrication 944, which may undopart of the modifications performed by OPC in order to meet maskcreation rules.

In some embodiments, mask data preparation 952 includes lithographyprocess checking (LPC) that simulates processing that will beimplemented by IC fab 940 to fabricate IC device 960. LPC simulates thisprocessing based on IC design layout 922 to create a simulatedmanufactured device, such as IC device 960. The processing parameters inLPC simulation can include parameters associated with various processesof the IC manufacturing cycle, parameters associated with tools used formanufacturing the IC, and/or other aspects of the manufacturing process.LPC takes into account various factors, such as aerial image contrast,depth of focus (“DOF”), mask error enhancement factor (“MEEF”), othersuitable factors, and the like or combinations thereof. In someembodiments, after a simulated manufactured device has been created byLPC, if the simulated device is not close enough in shape to satisfydesign rules, OPC and/or MRC are be repeated to further refine IC designlayout 922.

It should be understood that the above description of mask datapreparation 952 has been simplified for the purposes of clarity. In someembodiments, data preparation 952 includes additional features such as alogic operation (LOP) to modify the IC design layout according tomanufacturing rules. Additionally, the processes applied to IC designlayout 922 during data preparation 952 may be executed in a variety ofdifferent orders.

After mask data preparation 952 and during mask fabrication 944, a maskor a group of masks are fabricated based on the modified IC designlayout. In some embodiments, an electron-beam (e-beam) or a mechanism ofmultiple e-beams is used to form a pattern on a mask (photomask orreticle) based on the modified IC design layout. The mask can be formedin various technologies. In some embodiments, the mask is formed usingbinary technology. In some embodiments, a mask pattern includes opaqueregions and transparent regions. A radiation beam, such as anultraviolet (UV) beam, used to expose the image sensitive material layer(e.g., photoresist) which has been coated on a wafer, is blocked by theopaque region and transmits through the transparent regions. In oneexample, a binary mask includes a transparent substrate (e.g., fusedquartz) and an opaque material (e.g., chromium) coated in the opaqueregions of the mask. In another example, the mask is formed using aphase shift technology. In the phase shift mask (PSM), various featuresin the pattern formed on the mask are configured to have proper phasedifference to enhance the resolution and imaging quality. In variousexamples, the phase shift mask can be attenuated PSM or alternating PSM.The mask(s) generated by mask fabrication 944 is used in a variety ofprocesses. For example, such a mask(s) is used in an ion implantationprocess to form various doped regions in the semiconductor wafer, in anetching process to form various etching regions in the semiconductorwafer, and/or in other suitable processes.

IC fab 940 is an IC fabrication business that includes one or moremanufacturing facilities for the fabrication of a variety of differentIC products. In some embodiments, IC Fab 940 is a semiconductor foundry.For example, there may be a manufacturing facility for the front endfabrication of a plurality of IC products (front-end-of-line (FEOL)fabrication), while a second manufacturing facility may provide the backend fabrication for the interconnection and packaging of the IC products(back-end-of-line (BEOL) fabrication), and a third manufacturingfacility may provide other services for the foundry business.

IC fab 940 uses the mask (or masks) fabricated by mask house 930 tofabricate IC device 960. Thus, IC fab 940 at least indirectly uses ICdesign layout 922 to fabricate IC device 960. In some embodiments, asemiconductor wafer 952 is fabricated by IC fab 940 using the mask (ormasks) to form IC device 960. Semiconductor wafer 952 includes a siliconsubstrate or other proper substrate having material layers formedthereon. Semiconductor wafer further includes one or more of variousdoped regions, dielectric features, multilevel interconnects, and thelike (formed at subsequent manufacturing steps).

Details regarding an integrated circuit (IC) manufacturing system (e.g.,system 900 of FIG. 9), and an IC manufacturing flow associated therewithare found, e.g., in U.S. Pat. No. 9,256,709, granted Feb. 9, 2016, U.S.Pre-Grant Publication No. 20150278429, published Oct. 1, 2015, U.S.Pre-Grant Publication No. 20140040838, published Feb. 6, 2014, and U.S.Pat. No. 7,260,442, granted Aug. 21, 2007, the entireties of each ofwhich are hereby incorporated by reference.

One aspect of this description relates to an integrated circuit. In someembodiments, the integrated circuit includes a first set of gatestructures and a second set of gate structures. In some embodiments, acenter of each gate of the first set of gate structures being separatedfrom a center of an adjacent gate of the first set of gate structures ina first direction by a first pitch, the first set of gate structuresextending in a second direction different from the first direction. Insome embodiments, a center of each gate of the second set of gatestructures being separated from a center of an adjacent gate of thesecond set of gate structures in the first direction by the first pitch,the second set of gate structures extending in the second direction. Insome embodiments, a gate of the first set of gate structures is alignedin the second direction with a corresponding gate of the second set ofgate structures. In some embodiments, the gate of the first set of gatestructures is separated from the corresponding gate of the second set ofgate structures in the second direction by a first distance.

Another aspect of this disclosure relates to a system for manufacturingan integrated circuit. In some embodiments, the system includes anon-transitory computer readable medium configured to store executableinstructions; and a processor coupled to the non-transitory computerreadable medium. In some embodiments, the processor is configured toexecute the executable instructions for: placing a set of gate layoutpatterns on a first layout level, the set of gate layout patternscorresponding to fabricating a set of gate structures of the integratedcircuit, each of the layout patterns of the set of gate layout patternsbeing separated from an adjacent layout pattern of the set of gatelayout patterns in a first direction by a first pitch, the set of gatelayout patterns extending in a second direction different from the firstdirection and overlapping a set of gridlines, the set of gridlinesextending in the second direction, and each gridline of the set ofgridlines being separated from an adjacent gridline of the set ofgridlines by the first pitch; and placing a cut feature layout patternon the first layout level, the cut feature layout pattern extending inthe first direction and overlapping the set of gate layout patterns, thecut feature layout pattern identifying a location of a removed portionof a gate structure of the set of gate structures.

Still another aspect of this disclosure relates to a system formanufacturing an integrated circuit. In some embodiments, the systemincludes a non-transitory computer readable medium configured to storeexecutable instructions; and a processor coupled to the non-transitorycomputer readable medium. In some embodiments, the processor isconfigured to execute the executable instructions for: generating afirst set of gate layout patterns corresponding to fabricating a firstset of gate structures of the integrated circuit, each of the layoutpatterns of the first set of gate layout patterns being separated froman adjacent layout pattern of the first set of gate layout patterns in afirst direction by a first distance, the first set of gate layoutpatterns extending in a second direction different from the firstdirection and overlapping a first set of gridlines, the first set ofgridlines extending in the second direction, and each gridline of thefirst set of gridlines being separated from an adjacent gridline of thefirst set of gridlines by a first pitch; and generating a second set ofgate layout patterns corresponding to fabricating a second set of gatestructures of the integrated circuit, each of the layout patterns of thesecond set of gate layout patterns being separated from an adjacentlayout pattern of the second set of gate layout patterns in the firstdirection by a second distance, the second set of gate layout patternsextending in the second direction and overlapping a second set ofgridlines, the second set of gridlines extending in the seconddirection, and each gridline of the second set of gridlines beingseparated from an adjacent gridline of the second set of gridlines by asecond pitch.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. An integrated circuit comprising: a first set ofgate structures, a center of each gate of the first set of gatestructures being separated from a center of an adjacent gate of thefirst set of gate structures in a first direction by a first pitch, thefirst set of gate structures extending in a second direction differentfrom the first direction; and a second set of gate structures, a centerof each gate of the second set of gate structures being separated from acenter of an adjacent gate of the second set of gate structures in thefirst direction by the first pitch, the second set of gate structuresextending in the second direction, wherein a gate of the first set ofgate structures is aligned in the second direction with a correspondinggate of the second set of gate structures, and the gate of the first setof gate structures is separated from the corresponding gate of thesecond set of gate structures in the second direction by a firstdistance.
 2. The integrated circuit of claim 1, wherein the first set ofgate structures is a set of functional gate structures, and the secondset of gate structures is a set of non-functional gate structures. 3.The integrated circuit of claim 1, wherein the first distance rangesfrom about 0.01 μm to about 0.06 μm.
 4. The integrated circuit of claim1, further comprising: a first set of conductive structures extending inthe second direction, each conductive structure of the first set ofconductive structures being separated from one another in the firstdirection and being positioned between a corresponding pair of gates inthe first set of gate structures; and a second set of conductivestructures extending in the second direction, each conductive structureof the second set of conductive structures being separated from oneanother in the first direction and being positioned between acorresponding pair of gates in the second set of gate structures.
 5. Theintegrated circuit of claim 4, wherein a side of each conductivestructure in the first set of conductive structures is aligned with acorresponding side of each conductive structure in the second set ofconductive structures in the second direction.
 6. The integrated circuitof claim 1, further comprising: a first set of fins extending in thefirst direction and being below the first set of gate structures, eachof the fins of the first set of fins being separated from an adjacentfin of the first set of fins in the second direction by a first finpitch; and a second set of fins extending in the first direction andbeing below the second set of gate structures, each of the fins of thesecond set of fins being separated from an adjacent fin of the secondset of fins in the second direction by a second fin pitch.
 7. Theintegrated circuit of claim 1, further comprising: a first active regionextending in the first direction, and being below the first set of gatestructures; and a second active region extending in the first direction,being below the second set of gate structures, and being separated fromthe first active region in the second direction.
 8. The integratedcircuit of claim 1, wherein each gate of the first set of gatestructures is aligned in the second direction with each correspondinggate of the second set of gate structures.
 9. The integrated circuit ofclaim 1, wherein a side of each gate of the first set of gate structuresis aligned with a corresponding side of each gate of the second set ofgate structures in the second direction.
 10. A system for manufacturingan integrated circuit, the system comprising: a non-transitory computerreadable medium configured to store executable instructions; and aprocessor coupled to the non-transitory computer readable medium,wherein the processor is configured to execute the executableinstructions for: placing a set of gate layout patterns on a firstlayout level, the set of gate layout patterns corresponding tofabricating a set of gate structures of the integrated circuit, each ofthe layout patterns of the set of gate layout patterns being separatedfrom an adjacent layout pattern of the set of gate layout patterns in afirst direction by a first pitch, the set of gate layout patternsextending in a second direction different from the first direction andoverlapping a set of gridlines, the set of gridlines extending in thesecond direction, and each gridline of the set of gridlines beingseparated from an adjacent gridline of the set of gridlines by the firstpitch; and placing a cut feature layout pattern on the first layoutlevel, the cut feature layout pattern extending in the first directionand overlapping the set of gate layout patterns, the cut feature layoutpattern identifying a location of a removed portion of a gate structureof the set of gate structures.
 11. The system of claim 10, wherein theprocessor is further configured to execute instructions for: placing aset of fin layout patterns on a second layout level different from thefirst layout level, the set of fin layout patterns corresponding tofabricating a set of fins of the integrated circuit, the set of finlayout patterns extending in the first direction, each of the fin layoutpatterns of the set of fin layout patterns being separated from anadjacent fin layout pattern of the set of fin layout patterns in thesecond direction by a fin pitch.
 12. The system of claim 11, wherein theprocessor is further configured to execute instructions for: placing aset of active region layout patterns on a third layout level differentfrom the first layout level and the second layout level, the set ofactive region layout patterns extending in the first direction, andbeing separated from one another in the second direction, the set ofactive region layout patterns corresponding to fabricating a set ofactive regions of the integrated circuit.
 13. The system of claim 12,wherein the processor is further configured to execute instructions for:placing a set of conductive feature layout patterns on a fourth layoutlevel different from the first layout level, the second layout level andthe third layout level, the set of conductive feature layout patternsextending in the second direction, each layout pattern of the set ofconductive feature layout patterns being separated from one another inthe first direction, the set of conductive feature layout patternscorresponding to fabricating a set of conductive structures of theintegrated circuit.
 14. The system of claim 13, wherein the processor isfurther configured to execute instructions where: a layout pattern ofthe set of conductive feature layout patterns is between a layoutpattern of the set of gate layout patterns and an adjacent layoutpattern of the set of gate layout patterns.
 15. The system of claim 10,wherein the processor is further configured to execute instructionswhere: the removed portion of the gate structure of the set of gatestructures comprises: a cut length in the first direction, and a cutwidth in the second direction; and the cut feature layout patterncomprises: a pattern length in the first direction, the pattern lengthcorresponding to the cut length; and a pattern width in the seconddirection, the pattern width corresponding to the cut width.
 16. Thesystem of claim 10, wherein the processor is further configured toexecute instructions where: a first set of gate layout patternscorresponding to fabricating a set of functional gate structures of theintegrated circuit; and a second set of gate layout patternscorresponding to fabricating a set of non-functional gate structures ofthe integrated circuit.
 17. A system for manufacturing an integratedcircuit, the system comprising: a non-transitory computer readablemedium configured to store executable instructions; and a processorcoupled to the non-transitory computer readable medium, wherein theprocessor is configured to execute the executable instructions for:generating a first set of gate layout patterns corresponding tofabricating a first set of gate structures of the integrated circuit,each of the layout patterns of the first set of gate layout patternsbeing separated from an adjacent layout pattern of the first set of gatelayout patterns in a first direction by a first distance, the first setof gate layout patterns extending in a second direction different fromthe first direction and overlapping a first set of gridlines, the firstset of gridlines extending in the second direction, and each gridline ofthe first set of gridlines being separated from an adjacent gridline ofthe first set of gridlines by a first pitch; and generating a second setof gate layout patterns corresponding to fabricating a second set ofgate structures of the integrated circuit, each of the layout patternsof the second set of gate layout patterns being separated from anadjacent layout pattern of the second set of gate layout patterns in thefirst direction by a second distance, the second set of gate layoutpatterns extending in the second direction and overlapping a second setof gridlines, the second set of gridlines extending in the seconddirection, and each gridline of the second set of gridlines beingseparated from an adjacent gridline of the second set of gridlines by asecond pitch.
 18. The system of claim 17, wherein the processor isfurther configured to execute instructions for: generating a set ofconductive feature layout patterns extending in the second direction,each layout pattern of the set of conductive feature layout patternsbeing separated from one another in the first direction, the set ofconductive feature layout patterns corresponding to fabricating a set ofconductive structures of the integrated circuit.
 19. The system of claim17, wherein the processor is further configured to execute instructionsfor: generating a set of fin layout patterns corresponding tofabricating a set of fins of the integrated circuit, the set of finlayout patterns extending in the first direction and being below thefirst set of gate layout patterns and the second set of gate layoutpatterns, each of the fin layout patterns of the set of fin layoutpatterns being separated from an adjacent fin layout pattern of the setof fin layout patterns in the second direction by a fin pitch.
 20. Thesystem of claim 17, wherein the processor is further configured toexecute instructions for: generating a set of active region layoutpatterns extending in the first direction, being below the first set ofgate layout patterns and the second set of gate layout patterns, andbeing separated from one another in the second direction, the set ofactive region layout patterns corresponding to fabricating a set ofactive regions of the integrated circuit.